Trench corner effect bidirectional flash memory cell

ABSTRACT

A non-volatile memory cell structure that is capable of holding two data bits. The structure includes a trench in a substrate with two sides of the trench being lined with a trapping material. The trench is filled with an oxide dielectric material and a control gate is formed over the oxide-filled trench. Source/drain regions are adjacent the trench sides with the trapping material. An energy barrier between the drain and source regions has two local high points that correspond to the trench corners. To read the device, sufficient gate voltage is applied to invert the channel and a sufficient drain voltage is applied to pull down the drain-side barrier. If charges of opposite polarity are trapped in the source-side trench corner, the source barrier will be significantly lowered so that current flows between source and drain under read conditions.

RELATED APPLICATION

This Application is a Divisional of U.S. application Ser. No.10/656,636, titled “TRENCH CORNER EFFECT BIDIRECTIONAL FLASH MEMORYCELL,” filed Sep. 5, 2003, (allowed) which is commonly assigned andincorporated herein by reference.

TECHNICAL FIELD OF THE INVENTION

The present invention relates generally to memory cells and inparticular the present invention relates to structures of non-volatilememory cells.

BACKGROUND OF THE INVENTION

In order for memory manufacturers to remain competitive, memorydesigners must constantly increase the density of flash memory devices.Increasing the density of a flash memory device generally requiresreducing spacing between memory cells. It is becoming increasinglydifficult to further reduce spacing between memory cells. Closer packingalso generally requires smaller dimensions of device elements.

Smaller dimensions of many device elements may cause operationalproblems with the cell. For example, the channel between thesource/drain regions becomes shorter possibly causing severe shortchannel effects. Additionally, smaller size cells with a continuouslayer of oxide-nitride-oxide (ONO) may have a problem with chargemigrating from one bit-storage point to the other.

For the reasons stated above, and for other reasons stated below whichwill become apparent to those skilled in the art upon reading andunderstanding the present specification, there is a need in the art forsmaller non-volatile memory cells without the disadvantages inherent inthe smaller cells.

SUMMARY

The above-mentioned problems with increasing memory density and otherproblems are addressed by the present invention and will be understoodby reading and studying the following specification.

The present invention encompasses a trench corner effect, bidirectionalflash memory cell. The cell comprises a trench formed in a siliconsubstrate. A trapping material is deposited on the corners of at leasttwo sides of the trench. The trench is filled with an oxide material. Aplurality of active areas are located on the silicon substrate. Theactive areas are substantially adjacent to an opening of the trench andsubstantially adjacent to the trench sides having the trapping material.A control gate is located above the trench. In one embodiment, thecontrol gate partially overlaps each of the active areas.

Further embodiments of the invention include methods and apparatus ofvarying scope.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a cut-away view of one embodiment for a trench cornereffect bidirectional flash memory cell of the present invention.

FIG. 2 shows a top view of the trench corner effect bidirectional flashmemory cell of FIG. 1.

FIG. 3 shows one embodiment of the theory of operation of the trenchcorner effect bidirectional flash memory cell of FIG. 1 during aprogramming operation.

FIGS. 4A and B show plots of silicon-oxide interface potential versusdistance along the cell having no bias and a gate bias only.

FIGS. 5A and B show plots of silicon-oxide potential versus distancealong the cell with a drain/source bias applied simultaneously with agate bias.

FIGS. 6A and B show plots of silicon-oxide interface potential versusdistance along the cell with a drain/source bias applied simultaneouslywith a gate bias and trapping has occurred.

FIG. 7 shows a plot of silicon-oxide interface potential versus distancealong the cell with a drain and source bias applied to reduce both thedrain-side and source-side energy barriers.

FIG. 8 shows an alternate embodiment trapping layer configuration of theembodiment of FIG. 1.

FIG. 9 shows an alternate embodiment gate configuration for the trenchcorner effect bidirectional flash memory cell of the present invention.

FIG. 10 shows another alternate embodiment gate configuration for thetrench corner effect bidirectional flash memory cell of the presentinvention.

FIG. 11 shows yet another alternate embodiment gate configuration forthe trench corner effect bidirectional flash memory cell of the presentinvention.

DETAILED DESCRIPTION

In the following detailed description of the invention, reference ismade to the accompanying drawings that form a part hereof and in whichis shown, by way of illustration, specific embodiments in which theinvention may be practiced. In the drawings, like numerals describesubstantially similar components throughout the several views. Theseembodiments are described in sufficient detail to enable those skilledin the art to practice the invention. Other embodiments may be utilizedand structural, logical, and electrical changes may be made withoutdeparting from the scope of the present invention. The terms wafer orsubstrate, used in the following description, include any basesemiconductor structure. Both are to be understood as includingsilicon-on-sapphire (SOS) technology, silicon-on-insulator (SOI)technology, thin film transistor (TFT) technology, doped and undopedsemiconductors, epitaxial layers of a silicon supported by a basesemiconductor structure, as well as other semiconductor structures wellknown to one skilled in the art. Furthermore, when reference is made toa wafer or substrate in the following description, previous processsteps may have been utilized to form regions/junctions in the basesemiconductor structure, and terms wafer or substrate include theunderlying layers containing such regions/junctions. The followingdetailed description is, therefore, not to be taken in a limiting sense,and the scope of the present invention is defined only by the appendedclaims and equivalents thereof.

FIG. 1 illustrates a cut-away view of the structure of the of the trenchcorner effect, bidirectional flash memory cell of the present invention.The cell can be created as either a p-channel device or an n-channeldevice. The n-channel device provides for hole trapping while thep-channel device involves electron trapping.

The cell is comprised of a trench 101 that is oxide 102 filled. Inalternate embodiments, the trench is filled with other low-trap-densitydielectric materials.

On either side of the trench 101 are drain/source regions 103 and 104.These are either n+ or p+ regions, depending on the type of device asdiscussed previously. In one embodiment, the trench extends to a depthat least that of the drain/source regions 103 and 104. Since the memorycell of the present invention is a symmetrical device, the drain/sourceregions 103 and 104 are interchangeable. The applied voltage determineswhich side is the drain and which is the source. Therefore, thesubsequent discussion of these areas does not limit the presentinvention to any one configuration of drain and source regions.

Trapping layers 109 and 110 are formed on either side of the trench 101.These layers 109 and 110 are electrically isolated sections so thatthere is no migration of charges from one trapping layer 109 or 110 tothe other 110 or 109. As will be discussed subsequently, a data bit canbe stored in each corner of the trench in its respective trapping layer109 or 110.

In one embodiment, the trapping layers 109 and 110 are formed assubstantially uniform layers covering entire opposing sidewalls of thetrench. There is no trapping material across the bottom of the trench101. In an alternate embodiment, there is at most minimal trappingmaterial across the bottom of the trench so that the two trapping layers109 and 110 remain isolated from each other. In another alternateembodiment, the trapping layers 109 and 110 may be formed as acontinuous layer of trapping material.

FIG. 8 illustrates another embodiment of the trapping layers. In thisembodiment, the trapping layers 801 and 803 are formed only in thetrench corners since this is where the charge build-up occurs.

Referring again to FIG. 1, the type of trapping material 109 and 110depends on the type of cell. For example, a p-channel device might usean Oxide-Nitride-Oxide (ONO) structure. An n-channel device might use adifferent trapping structure. The present invention is not limited toany one type of trapping structure.

A control gate 107 of the cell of FIG. 1 is formed over the oxide-filledtrench 101 and overlaps the drain/source regions 103 and 104. Alternateembodiments for forming the gate structure are discussed subsequently.

FIG. 2 illustrates a top view of the trench corner effect, bidirectionalflash memory cell of FIG. 1. This view shows the gate structure 107overlapping the two drain/source regions 103 and 104.

FIG. 3 illustrates one embodiment of the theory of operation, during aprogramming operation, of the trench corner effect bidirectional flashmemory cell of FIG. 1. In this embodiment, the substrate (V_(b)) isbiased at less than 0V, the gate voltage V_(g) is 0V (or less than 0V)and the source voltage V_(s) is also 0V. The drain voltage V_(d) isbiased at a typical programming voltage. In one embodiment, this voltageis in a range of 6.0-8.5V. These voltages are for purposes ofillustration only. The present invention is not limited to any one setof voltages.

When a sufficiently high voltage is applied to the drain region,junction 301 breakdown occurs. The resulting charges are accelerated 303towards the substrate due to the drain-to-substrate voltage. Some of thecharges that are accelerated towards the substrate are redirected andtrapped in the oxide near the silicon-oxide interface along the side ofthe trench. In one embodiment, the trapping occurs at or near the trenchcorner 305 in the trapping layer. This trapped charge, being opposite inpolarity to the channel-type, lowers the drain-side energy barrier. Thedrain voltage further eliminates the drain-side energy barrier. Eventhough this is typically not a desirable effect for an isolation trench,it is utilized in the memory cell of the present invention as describedsubsequently with reference to FIGS. 4-7.

FIGS. 4-7 illustrate plots of silicon-oxide interface potential versusdistance across the cell. The silicon-oxide interface potential alongthe y-axis, increasing from bottom to top. The distance across thex-axis of the cell is typically measured in microns and increases fromleft to right. The plot's corresponding cell with its trench and activeareas is not shown for purposes of clarity but the elements of the cellare indicated by the voltage indicators (i.e., V_(s), V_(g), and V_(d)).

FIG. 4A illustrates a plot of silicon-oxide interface potential versusdistance for a cell without a gate voltage applied. Both V_(s) and V_(d)are 0V as well. The corner affect is not yet evident since there is nogate voltage to perturb the interface potential.

FIG. 4B illustrates the same plot as V_(g) is increased. The dottedlines indicating the change in the silicon-oxide interface potential asV_(g) increases. The top dotted line is where V_(g)=0. As V_(g)increases from 0, it begins to perturb the potential. In one embodiment,when V_(g)=14V, the two corner energy barriers 401 and 402 are fullyevident and current flow is unaffected by the center region of the cell.This embodiment shows that V_(s) and V_(d) are both 0V and the cornerenergy barriers 401 and 402 are not affected.

FIGS. 5A and B illustrate forward and reverse bias plots ofsilicon-oxide interface potential versus distance for a cell with aninitial drain/source bias simultaneously with a gate bias. FIG. 5A showsthe forward bias plot of the drain bias applied simultaneously with thegate bias. As the drain bias is increased, the drain energy barrier ispulled down further. FIG. 5B shows the reverse bias plot of the sourcebias applied simultaneously with the gate bias. As the source bias isincreased, the source energy barrier is pulled down further.

In both forward and reverse bias cases, illustrated in FIG. 5, thebarrier closest to the drain/source is pulled down but the oppositebarrier remains high since charges have not been trapped. This preventscurrent from flowing along the channel and neither bit can be read.

FIGS. 6A and B illustrate forward and reverse bias plots ofsilicon-oxide interface potential versus distance along the cell with adrain/source bias applied simultaneously with a gate bias and trappinghas occurred. FIG. 6A illustrates the forward biased condition with asufficient drain voltage applied, simultaneously with a gate voltage, toeliminate the drain-side energy barrier. In this case, no current flowsdue to the source-side energy barrier remaining high and blockingcurrent.

FIG. 6B illustrates the reverse biased condition with the source-sideenergy barrier pulled down by a sufficient source voltage. In this case,the drain-side energy barrier is eliminated by the trapped charge.Therefore, drain-side stress results in reverse current only.

FIG. 7 illustrates a plot of silicon-oxide interface potential versusdistance along the cell when a charge is trapped in both corners. Thedevice will conduct in either direction, depending on which end isbiased.

In the above embodiments of FIGS. 4-7, a sufficient drain/source voltageto pull down the respective energy barrier to allow current to flow maybe in the range of 6.0V to V. Alternate embodiments use other voltageranges to obtain substantially similar results, depending on the type ofmemory device. It should be noted that the reverse current may saturateat a predetermined source voltage in each of the above cases.

The trench corner effect bidirectional flash memory cell could beprogrammed and erased using methods substantially similar to parasiticfield devices. Programming (charge trapping) could be accomplished byjunction breakdown as described above. The effect can be accelerated byapplying a substrate voltage or a negative V_(g) bias for an n-channeldevice.

Reading the memory cell could be performed by applying a gate voltagesufficient to invert the trench bottom center as shown in FIGS. 6-7. Avoltage is also applied to the drain that pulls down the drain-sidebarrier. Current would then flow depending on whether there is a trappedcharge present at the source-side barrier.

Erasing the memory cell could be accomplished in multiple ways. Oneerase method would be to tunnel the charge out of the trapping layerinto the substrate by applying a voltage between the gate and thesubstrate/drain/source so as to produce a high electric field in thetrapping material.

A second erasing method includes using hot-carrier effects by pullingsignificant channel current such that a charge of the opposite polarityas the trapped charge would be injected into the trapping material andcompensate/combine with the trapped charge.

FIG. 9 illustrates an alternate embodiment gate configuration for thetrench corner effect bidirectional flash memory cell of the presentinvention. In this embodiment, the gate 901 is formed such that itextends down into the trench in a “T” configuration.

FIG. 10 illustrates another alternate embodiment gate configuration forthe trench corner effect bidirectional flash memory cell of the presentinvention. In this embodiment, the gate 1001 is formed within the oxidedielectric material 1003.

FIG. 11 illustrates yet another alternate embodiment gate configurationfor the trench corner effect bidirectional flash memory cell of thepresent invention. In this embodiment, the gate 1101 and 1102 is formedin two parts. One part 1102 formed within the oxide dielectric material1110 in the trench. The other part 1101 is formed over the trench andoverlapping the two active areas 1104 and 1105.

In the embodiments of FIGS. 9-11 above, an oxide material is illustratedbetween the trapping material along the sidewalls of the trench and theportion of the control gate extending into the trench. This oxide is notrequired for proper operation of the present invention. The gate may bein contact with the trapping material.

CONCLUSION

In summary, the non-volatile memory cell architecture of the presentinvention uses a trench corner barrier effect to produce a compact cellcontaining two logical bits. The absence or presence of the energybarrier, in response to the absence or presence of trapped charges,creates the non-volatile memory states.

Although specific embodiments have been illustrated and describedherein, it will be appreciated by those of ordinary skill in the artthat any arrangement that is calculated to achieve the same purpose maybe substituted for the specific embodiments shown. Many adaptations ofthe invention will be apparent to those of ordinary skill in the art.Accordingly, this application is intended to cover any adaptations orvariations of the invention. It is manifestly intended that thisinvention be limited only by the following claims and equivalentsthereof.

1. A trench corner effect, bidirectional flash memory cell comprising: atrench formed in a substrate; a trapping material along each of a firstand second side of the trench; a dielectric material filling the trench;a plurality of active areas formed in the substrate substantiallyadjacent to the first and second sides; and a control gate formed abovethe trench and comprising an extension that extends into the trench. 2.The memory cell of claim 1 wherein the trapping material has anoxide-nitride-oxide structure.
 3. The memory cell of claim 1 whereineach trapping material is adapted to store a charge independent of theother trapping material.
 4. The memory cell of claim 1 wherein thecontrol gate overlaps at least a portion of each active area.
 5. Thememory cell of claim 1 wherein a first active area of the plurality ofactive areas is a drain area and a second active area is a source area.6. A trench corner effect, bidirectional flash memory cell comprising: atrench having first and second opposing sidewalls formed in a siliconsubstrate; a low-trap-density dielectric filling the trench andextending above the substrate to overlap substrate edges adjacent to thefirst and second sidewalls; a first and second trapping layer formedrespectively over the first and second sidewalls between the dielectricand the substrate; a drain region formed in the substrate substantiallyadjacent to the first sidewall of the trench; a source region formed inthe substrate substantially adjacent to the second sidewall of thetrench; and a control gate formed over the trench and dielectric suchthat the control gate and dielectric overlap at least a portion of eachof the drain and source regions, the control gate comprising anextension that extends into the trench through the dielectric.
 7. Thememory cell of claim 6 wherein the cell is p-channel device and storeselectrons in the first and second trapping layers.
 8. The memory cell ofclaim 6 wherein the cell is an n-channel device and stores holes in thefirst and second trapping layers.
 9. The memory cell of claim 6 whereinthe control gate extension is substantially equal distance between thefirst and second trapping layers.
 10. A trench corner effect,bidirectional flash memory cell comprising: a trench formed in asubstrate, the trench comprising opposing first and second sidewalls; anoxide material substantially filling the trench and extending above thesubstrate and overlapping edges of the substrate that are adjacent tothe trench; a trapping layer formed along each of the first and thesecond sidewalls forming first and second trapping layers; drain andsource regions formed in the substrate, each region substantiallyadjacent to either the first or the second side; and a control gateformed over the trench and comprising an extension that extends into thetrench and between the trapping layers.
 11. The memory cell of claim 10wherein direction of operation of the memory cell determines which sideof the trench is adjacent to the drain region and which side is adjacentto the source region, the direction determined by biasing of the drainand source regions.
 12. The memory cell of claim 10 wherein a trappinglayer is also formed along the bottom of the trench connecting the firstand second trapping layers.
 13. The memory cell of claim 12 wherein thethickness of the trapping layer formed along the bottom of the trench issuch that the first and second trapping layers are isolated from eachother.
 14. The memory cell of claim 10 wherein the first, second, andbottom trapping layers form a continuous layer along the inside of thetrench.
 15. The memory cell of claim 10 wherein the cell is an n-channeldevice wherein the drain and source regions have p-type conductivity.16. The memory cell of claim 10 wherein the cell is a p-channel devicewherein the drain and source regions have n-type conductivity.
 17. Thememory cell of claim 10 wherein the trench extends into the siliconsubstrate at least as deep as the drain and source regions.
 18. Thememory cell of claim 10 wherein charge trapping in the trapping layersis accelerated by applying a substrate voltage.
 19. The memory cell ofclaim 10 wherein the cell is an n-channel device and charge trapping inthe charge trapping layers is accelerated by applying a negative gatebias.
 20. A method for fabricating a trench corner effect, bidirectionalflash memory cell, the method comprising: forming a trench in asubstrate; forming a trapping material along each of a first and secondside of the trench; filling the trench with a dielectric material;forming a plurality of active areas in the substrate substantiallyadjacent to the first and second sides; and forming a control gate abovethe trench including an extension that extends into the trench.